| Original language | English |
|---|---|
| Title of host publication | New trends in psychometrics |
| Editors | K. Shigemasu, A. Okada, T. Imaizuma, T. Hodhina |
| Place of Publication | Tokyo |
| Publisher | Universal Academic Press |
| Pages | 525-532 |
| Publication status | Published - 2008 |
Cite this
van der Ark, L. A., Croon, M. A., & Sijtsma, K. (2008). Possibilities and challenges in Mokken scale analysis using marginal models. In K. Shigemasu, A. Okada, T. Imaizuma, & T. Hodhina (Eds.), New trends in psychometrics (pp. 525-532). Tokyo: Universal Academic Press.
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title = "Possibilities and challenges in Mokken scale analysis using marginal models",
author = "{van der Ark}, L.A. and M.A. Croon and K. Sijtsma",
year = "2008",
language = "English",
pages = "525--532",
editor = "K. Shigemasu and A. Okada and T. Imaizuma and T. Hodhina",
booktitle = "New trends in psychometrics",
publisher = "Universal Academic Press",
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van der Ark, LA, Croon, MA & Sijtsma, K 2008, Possibilities and challenges in Mokken scale analysis using marginal models. in K Shigemasu, A Okada, T Imaizuma & T Hodhina (eds), New trends in psychometrics. Universal Academic Press, Tokyo, pp. 525-532.
Possibilities and challenges in Mokken scale analysis using marginal models. / van der Ark, L.A.; Croon, M.A.; Sijtsma, K.
New trends in psychometrics. ed. / K. Shigemasu; A. Okada; T. Imaizuma; T. Hodhina. Tokyo : Universal Academic Press, 2008. p. 525-532.Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific
TY - CHAP
T1 - Possibilities and challenges in Mokken scale analysis using marginal models
AU - van der Ark, L.A.
AU - Croon, M.A.
AU - Sijtsma, K.
PY - 2008
Y1 - 2008
M3 - Chapter
SP - 525
EP - 532
BT - New trends in psychometrics
A2 - Shigemasu, K.
A2 - Okada, A.
A2 - Imaizuma, T.
A2 - Hodhina, T.
PB - Universal Academic Press
CY - Tokyo
ER -
van der Ark LA, Croon MA, Sijtsma K. Possibilities and challenges in Mokken scale analysis using marginal models. In Shigemasu K, Okada A, Imaizuma T, Hodhina T, editors, New trends in psychometrics. Tokyo: Universal Academic Press. 2008. p. 525-532