Possibilities and challenges in Mokken scale analysis using marginal models

L.A. van der Ark, M.A. Croon, K. Sijtsma

Research output: Chapter in Book/Report/Conference proceedingChapterScientific

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Original languageEnglish
Title of host publicationNew trends in psychometrics
EditorsK. Shigemasu, A. Okada, T. Imaizuma, T. Hodhina
Place of PublicationTokyo
PublisherUniversal Academic Press
Pages525-532
Publication statusPublished - 2008

Cite this

van der Ark, L. A., Croon, M. A., & Sijtsma, K. (2008). Possibilities and challenges in Mokken scale analysis using marginal models. In K. Shigemasu, A. Okada, T. Imaizuma, & T. Hodhina (Eds.), New trends in psychometrics (pp. 525-532). Tokyo: Universal Academic Press.
van der Ark, L.A. ; Croon, M.A. ; Sijtsma, K. / Possibilities and challenges in Mokken scale analysis using marginal models. New trends in psychometrics. editor / K. Shigemasu ; A. Okada ; T. Imaizuma ; T. Hodhina. Tokyo : Universal Academic Press, 2008. pp. 525-532
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van der Ark, LA, Croon, MA & Sijtsma, K 2008, Possibilities and challenges in Mokken scale analysis using marginal models. in K Shigemasu, A Okada, T Imaizuma & T Hodhina (eds), New trends in psychometrics. Universal Academic Press, Tokyo, pp. 525-532.

Possibilities and challenges in Mokken scale analysis using marginal models. / van der Ark, L.A.; Croon, M.A.; Sijtsma, K.

New trends in psychometrics. ed. / K. Shigemasu; A. Okada; T. Imaizuma; T. Hodhina. Tokyo : Universal Academic Press, 2008. p. 525-532.

Research output: Chapter in Book/Report/Conference proceedingChapterScientific

TY - CHAP

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AU - Croon, M.A.

AU - Sijtsma, K.

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SP - 525

EP - 532

BT - New trends in psychometrics

A2 - Shigemasu, K.

A2 - Okada, A.

A2 - Imaizuma, T.

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PB - Universal Academic Press

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van der Ark LA, Croon MA, Sijtsma K. Possibilities and challenges in Mokken scale analysis using marginal models. In Shigemasu K, Okada A, Imaizuma T, Hodhina T, editors, New trends in psychometrics. Tokyo: Universal Academic Press. 2008. p. 525-532